Plasma Chemistry And Plasma Processing

雜志介紹

Plasma Chemistry And Plasma Processing雜志介紹

《Plasma Chemistry And Plasma Processing》是一本以English為主的未開放獲取國際優(yōu)秀期刊，中文名稱等離子化學(xué)和等離子處理，本刊主要出版、報(bào)道物理與天體物理-ENGINEERING, CHEMICAL領(lǐng)域的研究動(dòng)態(tài)以及在該領(lǐng)域取得的各方面的經(jīng)驗(yàn)和科研成果，介紹該領(lǐng)域有關(guān)本專業(yè)的最新進(jìn)展，探討行業(yè)發(fā)展的思路和方法，以促進(jìn)學(xué)術(shù)信息交流，提高行業(yè)發(fā)展。該刊已被國際權(quán)威數(shù)據(jù)庫SCIE收錄，為該領(lǐng)域相關(guān)學(xué)科的發(fā)展起到了良好的推動(dòng)作用，也得到了本專業(yè)人員的廣泛認(rèn)可。該刊最新影響因子為2.6，最新CiteScore 指數(shù)為5.9。

本刊近期中國學(xué)者發(fā)表的論文主要有：

• Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst

  Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

• Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma

  Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

• Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System

  Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

• A RF plasma source with focused magnetic field for material treatment

  Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

英文介紹

Plasma Chemistry And Plasma Processing雜志英文介紹

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.